Effect of crystallinity on thermal atomic layer etching of hafnium oxide, zirconium oxide, and hafnium zirconium oxide
نویسندگان
چکیده
منابع مشابه
Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films
Hafnium and zirconium oxide films were prepared by atomic layer deposition (ALD) from dialkylamido precursors. Water was used as the oxygen source. Nanolaminates of hafnium, zirconium and aluminum oxide were also prepared. Atomic force microscopy was used to characterize the surface morphology of 10–100 nm thick films grown from 501C to 3001C. X-ray diffraction was used to characterize the film...
متن کاملPhase stability of hafnium oxide and zirconium oxide on silicon substrate
Phase stabilities of Hf-Si-O and Zr-Si-O have been studied with first-principles and thermodynamic modeling. From the obtained thermodynamic descriptions, phase diagrams pertinent to thin film processing were calculated. We found that the relative stability of the metal silicates with respect to their binary oxides plays a critical role in silicide formation. It was observed that both the HfO2/...
متن کاملAtomic Layer Deposition of Insulating Hafnium and Zirconium Nitrides
Highly uniform, smooth, and conformal coatings of higher nitrides of hafnium and zirconium were produced by atomic layer deposition from homoleptic tetrakis(dialkylamido)metal(IV) complexes and ammonia at low substrate temperatures (150-250 °C). The precursor vapors were alternately pulsed into a heated reactor, yielding 1.15-1.20 Å of metal nitride film for every cycle. Successful depositions ...
متن کاملFlexible metal-insulator-metal capacitor using plasma enhanced binary hafnium-zirconium-oxide as gate dielectric layer
0026-2714/$ see front matter 2010 Elsevier Ltd. A doi:10.1016/j.microrel.2010.01.046 * Corresponding author. Tel.: +886 35712121x5580 E-mail address: [email protected] (F.-H. Ko). We have used a sol–gel spin-coating process to fabricate a new metal–insulator–metal capacitor comprising 10-nm thick binary hafnium–zirconium–oxide (HfxZr1 xO2) film on a flexible polyimide (PI) substrate. The su...
متن کاملThermal Stability of Nanostructurally Stabilized Zirconium Oxide
Nanostructurally stabilized zirconium oxide (NSZ) hard transparent fi lms were produced without chemical stabilizers by the ion beam assisted deposition technique (IBAD). A transmission electron microscopy study of the samples produced below 150 °C revealed that these fi lms are composed of zirconium oxide (ZrO2) nanocrystallites of diameters 7.5 ± 2.3 nm. X-ray and selected-area electron diffr...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Journal of Vacuum Science & Technology A
سال: 2020
ISSN: 0734-2101,1520-8559
DOI: 10.1116/1.5135317